AERA 3030-07404 Mass Flow Controller   

The AERA 3030-07404 mass flow controller is a thermal MFC specifically designed for semiconductor equipment, which achieves high-precision closed-loop flow control of process gases and ensures stable output of process gas ratios.
Product Features:
1. Thermal sensing detection, high flow measurement accuracy, and good consistency of process gas ratio
2. All metal sealed valve body, strong corrosion resistance, suitable for special and corrosive process gases
3. Ultra low leakage structure, low helium leak detection rate, reducing the loss of valuable process gases
4. Closed loop rapid adjustment, quick response, small flow switching overshoot, strong process stability
5. Standard VCR air circuit connector, compatible in size, easy to disassemble and replace, convenient for spare parts maintenance
Product Parameters:
1. Signal interface: 0-5V analog input/output
2. Working temperature: 5 ℃ -45 ℃, no condensation environment
3. Maximum intake pressure: 140PSI
4. Control accuracy: ≤± 1% of full scale
5. Leakage index: He leakage rate 1 × 10-10atm cc/sec
Application fields:
1. Process gas flow control for semiconductor etching equipment
2. Accurate gas source ratio for CVD thin film deposition equipment
3. Maintenance and replacement of original spare parts for semiconductor equipment
4. Flow control of gas supply in vacuum process chamber
5. Gas path system matching for plasma process equipment
Overall, the AERA 3030-07404 mass flow controller is a semiconductor core gas control component that provides stable and reliable gas flow control capabilities for precision processes.