DAIHEN 3Z80-001051-V2 Digital Plasma Controller  

DAIHEN 3Z80-001051-V2 Digital Plasma Controller

1. DAIHEN Semiconductor RF Supporting Digital Plasma Control Unit
2. Real time control of RF power and impedance matching process parameters
3. Digital signal processing, rapid closed-loop adjustment of plasma state
4. Multiple sets of IO channels, connecting the cavity with the upper control system
5. Built in filtering to resist electromagnetic interference in plasma environments
6. Electrical isolation to prevent damage to internal control circuits caused by high voltage surges
7. LED status indicator light, quickly identify process and hardware faults
8. Support bus communication, upload power and impedance operation data
9. Local storage of process parameters, no loss of power-off configuration
10. Multiple protections, triggering interlock for abnormal power and temperature
11. Modular structure, disassembly and replacement to shorten production line downtime
12. Industrial components, supporting 24/7 uninterrupted production
13. Anti vibration design, suitable for equipment cavity vibration conditions
14. Wide temperature operation to adapt to temperature fluctuations inside the cabinet
15. Original factory specifications, compatible with the entire DAIHEN RF power supply system
DAIHEN 3Z80-001051-V2 digital plasma controller, used for semiconductor equipment plasma process, realizing RF process closed-loop control and state monitoring