Edwards 3D80-0000300-V2 Turbomolecular Pump  

Edwards 3D80-0003000-V2 Turbomolecular Pump Provides High Vacuum Environment for Semiconductor Process Chambers to Ensure Process Stability
Product Features
Magnetic levitation oil-free design with high vacuum cleanliness
Sufficient pumping speed to quickly establish the target vacuum
Extremely low operating vibration without interfering with precision processes
Built in diagnostic function for real-time monitoring of pump body status
Corrosion resistant and compatible with various semiconductor process gases
Application Areas
Semiconductor dry etching vacuum chamber
CVD thin film deposition vacuum system
Ion implantation machine with vacuum unit
High vacuum chamber for wafer inspection
Optical coating vacuum production equipment
Mass spectrometer vacuum chamber
Electron microscope vacuum system
Material research vacuum experimental device
Vacuum leak detection equipment host
Surface analysis instrument vacuum module
Overall, Edwards 3D80-0003000-V2 turbomolecular pump is a commonly used high vacuum core component in semiconductor precision process equipment for its cleanliness, low vibration, and corrosion resistance