Edwards EUV3050H vacuum dry pump  

The Edwards EUV3050H vacuum dry pump is designed specifically for EUV lithography equipment to ensure the vacuum requirements of advanced semiconductor processes through rough cavity pumping
Product Features
Oil free dry structure will not produce oil pollution
Strong pumping ability, suitable for high flow hydrogen process
Lower energy consumption, long-term operation saves production costs
Strong corrosion resistance can handle various process by-products
Built in intelligent monitoring for convenient status viewing and maintenance
Application Areas
EUV lithography equipment vacuum roughing system
Pre vacuum unit for semiconductor dry etching
CVD thin film deposition vacuum unit
PVD magnetron sputtering with vacuum circuit
Ion implantation machine rough vacuum system
Vacuum extraction of wafer load lock chamber
Plasma cleaning equipment vacuum system
High end storage chip manufacturing vacuum equipment
Semiconductor R&D process vacuum device
Advanced material vacuum processing equipment
Overall, the Edwards EUV3050H vacuum dry pump is energy-saving, reliable, and adaptable to EUV advanced lithography processes. It is the pre core component of high-end semiconductor vacuum systems