ESA80W-HDF dry vacuum pump   

ESA80W-HDF Ebara dry vacuum pump adapted for semiconductor light gas process for establishing pre vacuum environment in large cavity rough pumping
Product Features
Oil free dry structure will not produce oil pollution
Optimizing pumping performance for light gases such as hydrogen
High pumping speed, fast evacuation, large capacity vacuum chamber
Intelligent speed regulation adapted to variable gas loads
Equipped with interlocking protection, the operating status can be monitored
Application Areas
MO-CVD thin film deposition vacuum system
Semiconductor large load lock cavity extraction
Pre rough drawing unit for wafer etching equipment
Thin film deposition equipment vacuum unit
Rough vacuum circuit of ion implantation machine
Flat panel display sputtering vacuum equipment
Photovoltaic thin film production vacuum unit
Research large chamber vacuum experimental device
Vacuum drying industrial processing equipment
Vacuum pumping of large cavity for optical coating
Overall, ESA80W-HDF dry vacuum pump is suitable for hydrogen process, stable pumping, and suitable for semiconductor large cavity mass production. It is the core component of the vacuum front-end system