KLA Tencor 720-24399-001 Scanner Module

Brand:KLA-Tencor
Model:720-24399-001
Product status: New/used
Shipping place: Xiamen, China
Warranty: 365 days
Structural form: Other (specific form may vary depending on application)
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Details

KLA Tencor 720-24399-001 Scanner Module

Product manual:

KLA Tencor 720-24399-001 Scanner Module
It is the core scanning control component used in the KLA Tencor high-precision semiconductor detection system,
Mainly used to drive and control optical systems or detection platforms for high-precision scanning at the nanometer/micrometer level.
It plays a crucial role in applications such as wafer inspection, defect analysis, and surface contour measurement.

1、 Basic Product Information
Product model: 720-24399-001

Module Name: Scanner Module

Manufacturer: KLA Tencor

Main function: Control the scanning platform or optical components to move at high speed and precision along a predetermined trajectory, achieving continuous acquisition of images or data

2、 Core functions
Function item description
Continuous motion of the scanning control platform or beam in the X/Y/Z axis or angular direction to achieve linear or matrix scanning paths.
Synchronize with image acquisition and real-time linkage with image boards or sensors to ensure synchronization between acquisition and displacement, and improve image accuracy.
Precision positioning feedback integrates position sensor feedback (such as laser interferometers, encoders) to ensure minimal scanning position errors.
Multiple scanning modes are supported, including point scanning, line scanning, and area scanning, to meet different detection needs.
Optimize scanning speed and acceleration with high dynamic response to improve the overall detection efficiency of the system.

3、 Application Fields
Defect Inspection of Wafer Surface
Control the optical system or platform to scan the wafer surface and cooperate with the image processing system for defect recognition.

Optical Metrology
Provide high stability scanning control in tasks such as thickness measurement, edge detection, and CD measurement.

Laser scanning system
Used for precise scanning of beams or sample stages in laser focusing systems.

Image stitching and macro positioning
Used for continuous image acquisition or high-resolution image stitching to improve detection coverage.