Lam 660-178383-001 RF Generator  

Lam 660-178383-001 RF generator is specially adapted for the Panlin etching machine to output RF energy and excite plasma to ensure stable etching process
Product Features
Accurate power control with high process consistency
Supports both pulse and continuous output modes
Built in automatic impedance matching to adapt to load changes
Water cooling and heat dissipation support long-term continuous mass production
Comes with multiple protections and fault diagnosis
Application Areas
Semiconductor dry etching equipment
PECVD plasma thin film deposition equipment
PVD magnetron sputtering coating equipment
High density plasma deposition equipment
Semiconductor plasma cleaning machine
Panel plasma process equipment
Wafer surface plasma treatment device
Storage chip thin film manufacturing equipment
Research plasma experimental chamber
Optical coating plasma deposition equipment
Overall, the Lam 660-178383-001 RF generator matched with the Panlin etching platform has stable power and is the core RF power supply component of the semiconductor etching process