Olympus DUV-KIT-2-2 microscope lens

Model:DUV-KIT-2-2
Product status: New/used
Shipping place: Xiamen, China
Warranty: 365 days
Structural form: Other (specific form may vary depending on application)
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Details

Olympus DUV-KIT-2-2 microscope lens

Product manual:

Olympus DUV-KIT-2-2 microscope lens
Olympus DUV-KIT-2-2 is a complete set of Olympus deep ultraviolet specialized microscope optical components, specializing in high-precision detection of semiconductor wafer microstructures
1. The optical system is optimized specifically for the 248nm deep ultraviolet band, greatly improving the ability to distinguish fine patterns
2. Non adhesive lens technology, avoiding long-term exposure to ultraviolet light aging, suitable for continuous testing on production lines
3. High numerical aperture design, strong light collection performance, sharp imaging details, and high contrast
4. Exclusive deep ultraviolet anti reflection coating with high ultraviolet transmittance, effectively suppressing stray light interference
6. Moderate working distance, sufficient space for wafer stage movement and sample cleaning operations
7. Compatible with multiple observation modes including bright field, dark field, differential interference DIC, and suitable for detecting various types of defects
8. Standard factory interface, can be directly paired with Olympus MX and BX series industrial inspection microscopes
9. Precision metal tube, excellent temperature drift control, long-term observation imaging without deviation
10. Surface hardening treatment of the lens, resistant to wiping and slight dust corrosion in the process environment
11. Modular kit, easy disassembly and replacement, high production line maintenance efficiency
12. Low gas release optical structure meets the clean use standards of dust-free wafer workshops
13. Can recognize small patterns at the 80nm level, far exceeding the detection limit of visible light lenses
14. Suitable for photolithography, etching, thin film process wafer circuit, hole, particle defect screening
15. The whole machine is earthquake resistant and stable, suitable for continuous 24-hour operation of automated machines
Overall, OLYMPUS DUV-KIT-2-2 deep ultraviolet imaging has high accuracy, durability, and stability, making it a core optical component for semiconductor micro defect detection