Spectrum 0190-22201 RF Generator  

Spectrum 0190-22201 RF Generator
Product Features
1 MKS ENI Spectrum11002-00 plasma RF power supply
2 output power 11000W working frequency 1.8 to 2.17MHz
Three phase 200 to 208V AC input high-power plasma process power supply
4. Built in power closed-loop control with stable and adjustable output power
5. Equipped with multiple protection mechanisms such as overcurrent, overpressure, and overheating
6 high-power forced air cooling for long-term continuous operation
7 supports remote control of power parameters through host communication signal interaction
8 panel status indicator lights facilitate quick fault diagnosis
9-rack mounted enclosure structure suitable for semiconductor cabinet installation
10 Applied to AMAT equipment old plasma equipment maintenance spare parts

Application Areas
1. Plasma source power supply for semiconductor etching process
2 Thin film deposition PVD CVD process RF excitation
High power RF output of plasma cleaning equipment
4. Replacement of spare parts for semiconductor AMAT equipment
5 wafer manufacturing plasma complete process matching

Semiconductor plasma process RF power supply Spectrum 0190-22201 is compatible with corresponding semiconductor process equipment