XEI 232260-01 Plasma Cleaner  

XEI 232260-01 plasma cleaner, a specialized plasma cleaning device for electron microscope vacuum chambers, removes organic carbon and hydrogen pollutants inside the chamber.
Product Features
1. Remote free radical cleaning, without directly bombarding samples and precision components
2. Radio frequency excited plasma efficiently decomposes oily and carbonaceous residues
3. Ordinary air can be used as the gas source without the need for special process gases
4. Low temperature cleaning mode to protect detectors and optical sensitive components
5. Built in closed-loop control, stable plasma working state
6. Equipped with pressure power monitoring and automatic safety protection for abnormal situations
7. Supports local panel operation and can also communicate with the main control system
8. Store multiple sets of cleaning formulas and execute the cleaning process with just one click
9. Standard vacuum interface for easy integration and assembly of vacuum equipment
10. Can be used as spare parts for analyzing equipment failure and replacing parts
Product Parameters
1. Type: Downstream RF plasma cleaning device
2. Incentive method: 13.56MHz RF drive
3. Gas source: air/oxygen-containing process gas
4. Communication: Internal communication interface of the device
5. Operating condition: Vacuum chamber environment, supporting continuous operation
XEI 232260-01 plasma cleaner has stable cleaning effect and is commonly used for maintenance of SEM and FIB electron microscopy equipment chambers and spare parts maintenance