KLA Tencor 820-08319-0 Scanner Module
Product manual:
Circuit board module with KLA Tencor number 820-08319-0
It is usually used as a core component in high-end detection equipment such as CD-SEM (Key Dimensional Scanning Electron Microscope).
This type of equipment is widely used in multiple key stages of the semiconductor manufacturing process. Its typical application areas are as follows:
Dimensional Control in Wafer Manufacturing
Used to detect the dimensions of key structures on wafers, such as line width and spacing,
Ensure that the pattern meets the design specifications to prevent electrical failure.
Process monitoring after etching and photolithography
After the photolithography or etching step, high-precision dimension measurement is performed on the pattern,
Evaluate whether the processing is accurate and adjust the process parameters in a timely manner.
Advanced process node monitoring
Applied in 7 nanometer, 5 nanometer, and even more advanced processes,
Assist in controlling process stability under complex processes such as multiple patterning and EUV.
Defect analysis and classification
Cooperate with automatic defect detection system to obtain high-resolution images,
Used to identify the source of defects, such as contamination, process deviation, or material issues.
Equipment debugging and process development
Widely used by process engineers in equipment development, parameter optimization, and production line maintenance processes,
Used to support detection, comparison, and data analysis.
Customers include wafer foundries and IDM manufacturers
Typical customers include TSMC, Intel, Samsung, Hynix, etc,
Used in its high-end chip production line.
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