3152419-206 RF Generator

Product manual:

3152419-206 RF Generator Product Application Fields:

semiconductor manufacturing

Used for plasma excitation and power supply in processes such as etching, deposition, and cleaning.

Flat panel display and optoelectronic industry

Thin film deposition and plasma treatment processes applied in the manufacturing of LCD, OLED and other panels.

Vacuum and plasma process equipment

Provide stable and controllable RF power output for the plasma system inside the vacuum chamber.

Material surface treatment

Used for surface modification, coating treatment, plasma cleaning, and activation to improve material properties.

Research and Laboratory Applications

Plasma experiments, material research, and process development in universities and research institutions.

Medical and Biotechnology

Plasma medical equipment, sterilization equipment, and systems related to biological material processing.

Photovoltaic and new energy industry

Plasma etching and thin film deposition processes in solar cell manufacturing.

Vacuum coating and coating equipment

RF power sources in PVD, CVD and other equipment ensure coating quality and consistency.

Industrial cleaning and processing equipment

Used for plasma cleaning and processing of precision devices and electronic components.

3152419-206 Product details picture:

3152419-206 product video

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