853-088976-004 RF Matching Box

Model:853-088976-004
Product status: New/used
Shipping place: Xiamen, China
Warranty: 365 days
Structural form: Other (specific form may vary depending on application)
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Details

853-088976-004 RF Matching Box

Product manual:

853-088976-004 RF Matching Box is mainly used in RF power systems to achieve impedance matching between RF sources and loads, improve energy transmission efficiency, and protect RF equipment. Its application areas include:

Semiconductor manufacturing equipment: used for plasma RF matching in processes such as etching and deposition.

Vacuum and thin film process system: Stable RF power output in PVD, CVD and other equipment.

Plasma processing equipment: achieving efficient coupling between RF source and plasma load.

RF power supply system: reduces reflected power and protects the stable operation of the RF generator.

Display panel and photovoltaic manufacturing: used in the process of gas plasma treatment.

Research and experimental equipment: supports impedance adjustment and power control in RF experiments.

Industrial surface treatment equipment: such as plasma cleaning and surface modification processes.

Vacuum coating equipment: Improve the stability and consistency of the thin film deposition process.

High end material processing: used for RF processing and preparation of special materials.

RF testing system: Implement load matching in the RF testing platform.

Industrial automation system: linked with control system to achieve automatic adjustment of RF parameters.

Equipment maintenance and upgrade: used to replace or upgrade existing RF matching units.

THE 853-088976-004 RF matching box is widely used in semiconductor, vacuum process, and RF plasma related fields due to its high matching accuracy, fast response speed, and strong reliability.