You are here:

AMAT 0041-76691 Heater

Brand: AMAT 
Model:0041-76691
Product status: New/used
Shipping place: Xiamen, China
Warranty: 365 days
Structural form: Other (specific form may vary depending on application)
Please contact Yvonne for quotation, thank you!

Details

AMAT 0041-76691 Heater

Product manual:

AMAT 0041-76691 Heater
Product Overview

AMAT (Applied Materials) 0041-76691 Heater
It is a specialized process heating component applied in semiconductor manufacturing equipment, mainly used to control the temperature environment of vacuum chambers or process platforms.
Through precise heating and temperature stability management, this heater provides ideal process conditions for deposition, etching, ion implantation, and other processes,
Ensure the quality of thin film deposition and process stability.

Technical parameters (typical direction, specific parameters need to refer to the original factory information)

Heating method: resistance heating/ceramic heating plate form

Temperature control range: supports stable adjustment from room temperature to several hundred degrees Celsius

Accuracy: Equipped with a closed-loop temperature control mechanism, high temperature control accuracy

Compatibility: Compatible with AMAT PVD, CVD and other platforms

Material characteristics: high temperature resistance, corrosion resistance, suitable for vacuum and reactive atmosphere environments

Application scenarios

Semiconductor front-end process

CVD (Chemical Vapor Deposition): Heating the reaction chamber or wafer substrate to ensure uniform deposition of thin films.

PVD (Physical Vapor Deposition): Provides a stable heat source for the target material or cavity, ensuring consistent thickness of the deposited layer.

Etching process: Maintain stable chamber temperature during plasma etching to prevent residue deposition.

Ion implantation system

Provide substrate preheating or process constant temperature required during ion implantation to improve ion implantation uniformity.

Wafer processing and cleaning

In wet or dry cleaning processes, heating is used to improve chemical reaction rates and optimize cleaning efficiency.

Vacuum chamber environment control

Used to maintain a constant temperature inside the cavity, avoiding condensation or particle contamination.

Improve the stability of vacuum systems in high-temperature environments.

R&D and experimental platform

Applied to the process development laboratory for exploring new material deposition and process windows.

AMAT 0041-76691 Product details picture:

0041-76691

AMAT 0041-76691 product video

More related products:

PPD513 3BHE039724R1060 Controller Module
NI PXIE-4139 Source Measurement Unit
RTD IPWR104HR-H100W power module

More product recommendations:

A4H124-24FX P0973JN switches
MVI56-MNETC Redundant module
NI SCXI-1104C Voltage module

You may also like