AMAT Applied Materials 0120-93660 Conduit PCB Card

Brand: AMAT Applied Materials
Model:0120-93660
Product status: New/used
Shipping place: Xiamen, China
Warranty: 365 days
Structural form: Other (specific form may vary depending on application)
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Details

AMAT Applied Materials 0120-93660 Conduit PCB Card

Product manual:

Product Overview

AMAT 0120-93660 catheter PCB card is a key electronic module in Applied Materials semiconductor ion implantation equipment. This card board is installed in the Guiding Tube section of the ion implantation system for control, monitoring, and signal processing. It plays an important role in ion beam transmission and alignment, ensuring stable and uniform beam paths, and maintaining high precision and consistency of the process.

Technical parameters (inference and industry norms)

Function type: Catheter control and monitoring circuit board

Applicable equipment: Quantum X single crystal circular high current ion implantation system and related models

Power supply: commonly low voltage direct current (such as 24V DC or ± 15V DC)

Signal interface: analog and digital mixed signal interface, supporting sensor input and control output

Monitoring content: voltage, current, temperature, conduit position or beam related parameters

Working environment: Stable operation in clean room, vacuum or low-pressure environment

Reliability design: resistant to electromagnetic interference, ion beam environment, and supports long-term continuous operation

Application scenarios

Ion beam guidance control

Assist the catheter in deflection, focusing, and path adjustment of the ion beam to ensure uniform beam injection into the wafer.

Process monitoring and feedback

Collect sensor signals from the catheter, monitor electrical status and operating parameters, and provide real-time feedback to the upper computer control system.

Security and protection

Detect abnormal situations (such as overheating, voltage fluctuations, signal distortion), trigger protection logic, and ensure the safety of equipment and wafers.

Improved accuracy and stability

By finely controlling the ion beam transmission path, the consistency and production yield of doping processes can be improved.