AMAT Applied Materials 0190-34229 Flow Controller

Brand: AMAT Applied Materials
Model:0190-34229
Product status: New/used
Shipping place: Xiamen, China
Warranty: 365 days
Structural form: Other (specific form may vary depending on application)
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Details

AMAT Applied Materials 0190-34229 Flow Controller

Product manual:

Product Overview

The AMAT 0190-34229 flow controller is a key module used in Applied Materials semiconductor process equipment for precise control of gas flow. It is commonly used in chemical vapor deposition (CVD), physical vapor deposition (PVD), etching (Etch) and other processes to precisely adjust the flow rate of process gases to ensure stable process parameters and consistent process quality.

Technical parameters (typical features)

Type: Mass Flow Controller (MFC)

Function: Accurately control gas flow and achieve closed-loop flow regulation

Flow range: usually from a few sccm to several thousand sccm (depending on process requirements)

Accuracy: High precision flow control (error usually ± 1%~± 2% FS)

Interface type: digital or analog input/output, can be linked with a controller or PLC

Control mode: closed-loop control, supporting real-time feedback adjustment

Work environment: cleanroom compatible, chemically resistant, and adaptable to semiconductor process conditions

Compatible devices: Various deposition, etching, and ion implantation equipment from Applied Materials

Application scenarios

Process gas flow control

Accurately adjust the flow rate of reaction gas or carrier gas to ensure process stability.