AMAT Applied Materials 4100-060G-M02 Pressure Sensor

Brand: AMAT Applied Materials
Model:4100-060G-M02
Product status: New/used
Shipping place: Xiamen, China
Warranty: 365 days
Structural form: Other (specific form may vary depending on application)
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Details

AMAT Applied Materials 4100-060G-M02 Pressure Sensor

Product manual:

Product Overview

AMAT 4100-060G-M02 is a pressure sensor component used in Applied Materials semiconductor equipment. It is one of the key detection components of AMAT equipment.

Technical parameters (inferred based on public information and common AMAT pressure sensor characteristics)

Type: Pressure Sensor/Gauge.

Measurement range: Typically ranging from high vacuum to atmospheric pressure (such as 10 ⁻⁶ Torr~760 Torr), with different versions covering different pressure ranges.

Output signal: commonly used as analog voltage/current output (such as 0-10 VDC or 4-20 mA), some models support digital interfaces.

Installation method: Flanged or threaded interface for easy installation of cavities or pipelines.

Accuracy and stability: Suitable for high-precision pressure control in semiconductor processes, with good long-term stability and repeatability.

Environmental adaptability: It can operate in high cleanliness and low particle environments, and some models have corrosion-resistant structures.

Application scenarios

Vacuum chamber pressure monitoring

Installed in CVD, PVD, Etch and other process chambers, providing real-time feedback on vacuum level.

Gas flow and exhaust system control

Cooperate with a Mass Flow Controller (MFC) and valves to achieve closed-loop control of gas input and extraction.

Process stability guarantee

During sedimentation, etching, and other processes, the vacuum pump and valve actions are regulated by pressure sensor signals to ensure process consistency.

safety protection

When the pressure exceeds the set range, the interlock protection is triggered to avoid chamber damage or process abnormalities.

Product advantages

High sensitivity and precision: meet the demanding pressure control requirements of sub micron semiconductor processes.

Quick response: able to reflect real-time pressure fluctuations in the chamber and support rapid process switching.

Strong reliability: suitable for long-term operation, high stability, and reduces calibration frequency.

Good compatibility: Customized for AMAT machines, the interface and communication methods seamlessly match the entire system.