HUTTINGER C40-0851.02 RF board

Product manual:

HUTTINGER C40-0851.02 RF board
Product Overview

Huttinger C40-0851.02 is an industrial grade RF control board used for RF signal conditioning and power control in RF generators, power amplifiers, or plasma systems. This board can achieve high-precision RF output control, load matching optimization, and status monitoring, and is a key module in semiconductor manufacturing, thin film deposition, and scientific research experiments.

Model: C40-0851.02

Type: RF Control Board

Function: RF signal regulation, power control, load matching

Application areas: semiconductor manufacturing, PVD/CVD thin film process, plasma treatment, and scientific research experiments

Product Features

High precision RF control

It can accurately adjust the RF power, voltage, and current output by the generator or power amplifier to ensure process stability.

Load matching optimization

Collaborate with the matching network to achieve optimal impedance matching between the RF system and the load, reduce reflected power, and improve energy transmission efficiency.

Industrial grade reliability

High stability design, supports continuous long-term operation, and has strong anti-interference ability.

protection function

Built in overcurrent, overvoltage, and short-circuit protection to enhance system safety and prevent module or load damage.

modular design

Easy to install, replace, and maintain, compatible with HUTTINGER series generators, power amplifiers, and matching networks.

Remote and local control

Supports local operation panel and remote control interface, making it easy to integrate into automated process systems.

Application field

Semiconductor Manufacturing

RF power control for plasma etching, ion implantation, and thin film deposition processes.

Thin film deposition and surface treatment

High precision processes such as PVD/CVD technology, optical coating, and industrial coating.

Scientific research experiment

The core control module in materials science, plasma physics, and high-frequency RF experiments.

industrial manufacturing

RF control for precision surface treatment, functional film processing, and continuous production processes.

Product details picture:

C40-0851.02

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