Huttinger C4013630103 ID126870 RF Control Module
Brand:Huttinger
Model:C4013630103 ID126870
Product status: New/used
Shipping place: Xiamen, China
Warranty: 365 days
Structural form: Other (specific form may vary depending on application)
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Details
Huttinger C4013630103 ID126870 RF Control Module
Product manual:
Huttinger C4013630103 ID126870 RF Control Module
Product Overview
Huttinger C4013630103 (ID126870) is an industrial grade RF control module used for precise control of RF output in RF generators, power amplifiers, and plasma systems.
This module can achieve high-precision signal regulation, load matching control, and protection functions, and is an important component for high-end processes such as semiconductor manufacturing, thin film deposition, and scientific research experiments.
Model: C4013630103
ID:126870
Type: RF Control Module
Function: RF signal control, power regulation, status monitoring
Application areas: semiconductor manufacturing, PVD/CVD thin film process, plasma treatment, and scientific research experiments
Product Features
High precision RF control
It can accurately adjust the RF power, voltage, and current output by the generator or power amplifier to ensure process stability.
Load matching optimization
Collaborate with the matching network to achieve optimal impedance matching between the RF system and the load, reduce reflected power, and improve energy transmission efficiency.
High reliability design
Industrial grade module, supports continuous long-term operation, strong anti-interference ability, and adapts to complex industrial environments.
Safety protection function
Built in overcurrent, overvoltage, and short-circuit protection to prevent damage caused by equipment or process abnormalities.
Modularity and compatibility
Modular design facilitates installation, replacement, and maintenance.
Compatible with HUTTINGER series RF generators, power amplifiers, and matching networks.
Strong controllability
Supports local and remote control interfaces, facilitating integration into automated process systems.
Application field
Semiconductor Manufacturing
RF power control for processes such as plasma etching, ion implantation, and thin film deposition.
Thin film deposition and surface treatment
Precision processes such as PVD/CVD technology, optical coating, and industrial coating.
Scientific research experiment
The core control module in materials science, plasma physics, and high-frequency RF experiments.
industrial manufacturing
RF control for precision surface modification, functional film processing, and continuous production processes.
Product details picture:

C4013630103 ID126870
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