HUTTINGER THE-911811 Arc Control Card

Brand:Huttinger
Model:THE-911811
Product status: New/used
Shipping place: Xiamen, China
Warranty: 365 days
Structural form: Other (specific form may vary depending on application)
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Details

HUTTINGER THE-911811 Arc Control Card

Product manual:

HUTTINGER THE-911811 Arc Control Card
Product Overview

Huttinger THE-911811 is an arc control card specifically designed for industrial plasma or RF systems, primarily used for monitoring and controlling arc discharge in plasma or high-voltage DC power generation modules. This control card can improve process stability, protect equipment safety, and play a key role in high-precision industrial processes.

Model: THE-911811

Type: Arc Control Card

Function: Monitor and control arc status, protect power modules and process equipment

Application areas: semiconductor manufacturing, sputtering deposition, PVD/CVD process, scientific research experiments

Product Features

Arc detection and protection

Real time detection of arc occurrence can quickly respond to abnormal discharge and prevent equipment damage.

Built in overcurrent and overvoltage protection functions enhance system security.

high-precision control

Being able to accurately control the arc triggering and maintenance process, ensuring the stability and repeatability of plasma technology.

Strong compatibility

Can be used in conjunction with HUTTINGER series generators, power amplifiers, and matching networks to meet different process requirements.

Industrial grade reliability

High stability design, suitable for production environments with long-term continuous operation.

Strong anti-interference ability, suitable for process environments such as radio frequency and high voltage.

Modular and easy to maintain

Modular circuit design for quick replacement and maintenance.

Support integration into automation control systems to achieve remote monitoring and control.

Process optimization support

While controlling the arc, it can assist in optimizing process parameters and improving the process quality of thin film deposition, etching, or surface treatment.

Typical application areas

Semiconductor manufacturing: plasma etching, ion implantation, and thin film deposition processes.

Sputtering deposition and vacuum coating: protect the power module and ensure the stability of the sputtering target material process.

Photovoltaic and display panel production: Optimize arc control and improve film deposition consistency.

Research experiments: plasma physics, arc characteristics research, and material surface treatment experiments.