TEL Tokyo Electron 5139-000072-31 RF Matching Module

Brand:TEL Tokyo Electron
Model:5139-000072-31
Product status: New/used
Shipping place: Xiamen, China
Warranty: 365 days
Structural form: Other (specific form may vary depending on application)
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Details

TEL Tokyo Electron 5139-000072-31 RF Matching Module

Product manual:

Optimization of RF power transmission in semiconductor manufacturing equipment
Core function: The RF matching module is used to adjust the impedance matching of RF signals,
Maximizing RF power transmission efficiency and reducing signal reflection loss.

Key significance: Ensure stable transmission of RF energy in plasma processes such as etching and deposition,
Improve process consistency and processing quality.

Application scenarios: plasma etching equipment, chemical vapor deposition (CVD) systems, high-frequency power supply links, etc.

2. Stable control of RF system
Dynamic matching adjustment: The module can monitor RF parameters in real-time and automatically adjust the matching status,
Adapt to process changes and maintain stable system operation.

Preventing equipment damage: effectively avoiding reflected power backflow caused by impedance mismatch,
Protect RF power sources and related components.

3. High frequency signal processing and transmission
Signal integrity assurance: Optimize the transmission path of RF signals to reduce signal distortion and interference.

Improving equipment performance: Enhancing the efficiency of RF systems, ensuring high repeatability and precision of processes.

4. Key RF components in industrial automation
Integrated application: As an indispensable RF module in semiconductor manufacturing equipment,
Support efficient collaboration of the overall automation control system.

Environmental adaptability: Designed to meet the requirements of high cleanliness and high stability environments,
Suitable for complex process requirements in semiconductor manufacturing.

summarize
TEL 5139-000072-31 RF matching module focuses on efficient transmission and impedance matching of RF signals,
Radio frequency plasma process systems widely used in semiconductor manufacturing equipment.
Its high-precision matching and adjustment capability ensures the stable operation and process quality of the equipment, and is an indispensable key component for ensuring high-quality semiconductor processing.