TEL Tokyo Electron CPC-T00001A-13 Analysis Module

Product manual:

1、 Product functional positioning
The CPC-T00001A-13 analysis module is a process monitoring and parameter analysis component in the Tokyo Electron semiconductor equipment system,
Mainly used for collecting, analyzing, and providing feedback on key process data to assist in achieving closed-loop control and quality assurance of equipment operation processes.

This module may combine gas monitoring, plasma state, power waveform, temperature
Real time analysis of various parameters such as vacuum degree, used to optimize processes, improve equipment yield and production stability.

2、 Main application areas
1. Semiconductor process monitoring and analysis
Typical application devices:

Plasma etching system (Etcher)

Thin film deposition systems (CVD, ALD, PVD)

Wafer cleaning and surface treatment equipment

Vacuum chamber process equipment

Main monitoring objects:

Plasma state monitoring: changes in luminescence intensity, spectrum, discharge current, etc;

Process gas state analysis: by connecting gas sensors or residual gas analyzers (RGA);

Power/frequency feedback: monitoring the impact of RF power changes on plasma stability.

2. Data source for closed-loop process control system
Linkage with the main control system: Analyze module data as control logic input,
Guide the system to adjust temperature, gas flow rate, and power matching;

Improve stability and reproducibility: By monitoring fluctuation trends, achieve parameter adaptive optimization;

Abnormal detection and alarm: It can capture abnormal deviations, such as overpressure, plasma failure, gas mixing abnormalities, etc., and trigger linkage alarms and protection actions.

3. Key links in process optimization and yield improvement
Analysis result output: The module can output structured analysis data for engineers' reference,
Assist in process fine-tuning or problem tracing;

Collaboration with upper level software: supports uploading collected data to Tokyo Electron's process analysis platform, MES system, or data warehouse;

Edge computing features: it may have some local data processing capabilities to improve real-time performance and reduce master control load.

Product details picture:

CPC-T00001A-13

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