TEL Tokyo Electron TW39-000021-11 RF Automatic Mixing Console
Brand:TEL Tokyo Electron
Model:TW39-000021-11
Product status: New/used
Shipping place: Xiamen, China
Warranty: 365 days
Structural form: Other (specific form may vary depending on application)
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Details
TEL Tokyo Electron TW39-000021-11 RF Automatic Mixing Console
Product manual:
TEL Tokyo Electron TW39-000021-11 RF Automatic Mixing Console
product type
RF Auto Matching Unit
Function Introduction
This module is used in Tokyo Electron semiconductor equipment, mainly for:
Automatic impedance tuning and matching in radio frequency (RF) systems
Achieve optimal matching between RF power source and plasma load, and reduce reflected power
Improve energy transmission efficiency, protect RF generators and load components
Main technical characteristics (typical parameters)
Operating frequency: 13.56 MHz or 40.68 MHz (specific model to be determined)
RF power range: 2kW to 20kW (depending on the power level of the application device)
Fast response speed, suitable for quickly tuning load changes in plasma processes
Automatically adjust the capacitor/inductor matching network to achieve real-time impedance matching
application area
Widely used in the following semiconductor devices of Tokyo Electron:
Plasma etching system
Chemical Vapor Deposition (CVD) System
Atomic Layer Deposition (ALD) equipment
Cleaning equipment and other systems involving high-frequency plasma
Precautions for use
Must be used in conjunction with RF power supply (such as Daihen RF Generator)
Correctly connect RF cables, loads, and control signal interfaces during installation
Product details picture:
TW39-000021-11
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