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TEL Tokyo Electron TW39-000021-11 RF Automatic Mixing Console

Brand:TEL Tokyo Electron
Model:TW39-000021-11
Product status: New/used
Shipping place: Xiamen, China
Warranty: 365 days
Structural form: Other (specific form may vary depending on application)
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Details

TEL Tokyo Electron TW39-000021-11 RF Automatic Mixing Console

Product manual:

TEL Tokyo Electron TW39-000021-11 RF Automatic Mixing Console

product type
RF Auto Matching Unit

Function Introduction
This module is used in Tokyo Electron semiconductor equipment, mainly for:

Automatic impedance tuning and matching in radio frequency (RF) systems

Achieve optimal matching between RF power source and plasma load, and reduce reflected power

Improve energy transmission efficiency, protect RF generators and load components

Main technical characteristics (typical parameters)
Operating frequency: 13.56 MHz or 40.68 MHz (specific model to be determined)

RF power range: 2kW to 20kW (depending on the power level of the application device)

Fast response speed, suitable for quickly tuning load changes in plasma processes

Automatically adjust the capacitor/inductor matching network to achieve real-time impedance matching

application area
Widely used in the following semiconductor devices of Tokyo Electron:

Plasma etching system

Chemical Vapor Deposition (CVD) System

Atomic Layer Deposition (ALD) equipment

Cleaning equipment and other systems involving high-frequency plasma

Precautions for use
Must be used in conjunction with RF power supply (such as Daihen RF Generator)

Correctly connect RF cables, loads, and control signal interfaces during installation

Product details picture:

TW39-000021-11

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