Tokyo Electron 2L39-000065-31 Generator

Product manual:

1. Power source in RF/plasma power supply system
Core function: 2L39-000065-31 generator may serve as a radio frequency (RF) power generation module for plasma sources,
Provide high-frequency electrical energy for plasma processes such as etching or CVD.

Applicable processes: such as reactive ion etching (RIE), inductively coupled plasma (ICP)
Semiconductor manufacturing processes such as plasma cleaning and PECVD.

Process advantages: Stable output RF power to ensure stable plasma excitation,
Improve process repeatability and process control accuracy.

2. Specialized electrical energy conversion module for semiconductor equipment
Power role: As an internal power generation component, it provides customized voltage/frequency conversion for specific process modules.

Multiple forms: can be used for power generation purposes in different frequency ranges such as DC, RF, or intermediate frequency (MF),
Work together with matching devices, rectifiers, and other modules.

Interface application: usually integrated with RF matching networks, temperature control modules, electrodes, or reaction chambers.

3. Equipment autonomous energy supply and process stability guarantee
System independence: The built-in power generation module can reduce dependence on external power grid fluctuations and enhance the overall anti-interference ability of the machine.

Dynamic response: supports fast start-up and power adjustment to meet the requirements of different stages of the process.

4. Scope of application devices
Typical supporting equipment:

Dry Etcher

PECVD equipment

Plasma cleaning system

Surface modification/etching equipment, etc

Main industries:

Semiconductor wafer manufacturing

Micro Electro Mechanical Systems (MEMS)

Processing of optoelectronic components and display devices

Product details picture:

2L39-000065-31

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