Details
Tokyo Electron 2L39-000065-31 Generator
Product manual:
1. Power source in RF/plasma power supply system
Core function: 2L39-000065-31 generator may serve as a radio frequency (RF) power generation module for plasma sources,
Provide high-frequency electrical energy for plasma processes such as etching or CVD.
Applicable processes: such as reactive ion etching (RIE), inductively coupled plasma (ICP)
Semiconductor manufacturing processes such as plasma cleaning and PECVD.
Process advantages: Stable output RF power to ensure stable plasma excitation,
Improve process repeatability and process control accuracy.
2. Specialized electrical energy conversion module for semiconductor equipment
Power role: As an internal power generation component, it provides customized voltage/frequency conversion for specific process modules.
Multiple forms: can be used for power generation purposes in different frequency ranges such as DC, RF, or intermediate frequency (MF),
Work together with matching devices, rectifiers, and other modules.
Interface application: usually integrated with RF matching networks, temperature control modules, electrodes, or reaction chambers.
3. Equipment autonomous energy supply and process stability guarantee
System independence: The built-in power generation module can reduce dependence on external power grid fluctuations and enhance the overall anti-interference ability of the machine.
Dynamic response: supports fast start-up and power adjustment to meet the requirements of different stages of the process.
4. Scope of application devices
Typical supporting equipment:
Dry Etcher
PECVD equipment
Plasma cleaning system
Surface modification/etching equipment, etc
Main industries:
Semiconductor wafer manufacturing
Micro Electro Mechanical Systems (MEMS)
Processing of optoelectronic components and display devices
Product details picture:

2L39-000065-31
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