Tokyo Electron 3D80-000762-21 Matcher Module

Product manual:

Tokyo Electron 3D80-000762-21 Matching Network Module
It is a key component used for radio frequency (RF) power transmission and impedance matching in semiconductor manufacturing equipment,
Mainly used in RF systems for plasma etching and deposition equipment.
This module ensures efficient transfer of RF energy to the reaction chamber, optimizing plasma stability and process consistency.

1、 Product functional positioning
Module type: RF matching network module

Main functions:

Adjust the impedance of the RF output terminal to achieve optimal matching between the source and load;

Minimize reflected power and improve RF energy transmission efficiency;

Protect the RF power source to avoid overload and damage;

Support automatic or manual matching adjustment function.

2、 Main application areas
1. Plasma etching equipment
Maintain the stability of the plasma inside the cavity;

Ensure optimal power transmission between RF power supply and load;

Adapt to impedance changes under different process gases and chamber conditions.

2. Chemical vapor deposition (CVD) and physical vapor deposition (PVD) systems
Optimize RF plasma generation to improve film uniformity and quality;

Ensure the safe operation of high-frequency power supply.

3. Plasma enhanced processes (PECVD, RIE)
Dynamically adjust matching parameters to meet the requirements of multi process switching.

Product details picture:

3D80-000762-21

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