Tokyo Electron ES1D80-003817-15 Matcher

Product manual:

Tokyo Electron ES1D80-003817-15 Matching Network
It is an impedance matching module used in radio frequency (RF) energy systems,
Widely used in equipment such as TEL (Tokyo Electron) etching or plasma deposition,
Used to ensure optimal impedance matching between RF power supply and process chamber, thereby maximizing energy transfer efficiency and stabilizing plasma characteristics.

1、 Basic Product Information
Product Name: Matching Network

Product model: ES1D80-003817-15

Equipment ownership: Tokyo Electron semiconductor manufacturing equipment (usually sub modules belonging to D80 or D80 series)

2、 Core functions
Automatic impedance matching

Real time monitoring of impedance changes in the process chamber, automatic adjustment of matching inductance/capacitance;

Accurately match the output impedance of the RF power supply (usually 50 Ω) with the process load;

Ensure minimum reflected power and maximize the effective utilization of RF energy.

Stability guarantee of plasma process

Maintaining stable RF power transmission helps to stabilize plasma density and uniformity;

Adapt to impedance changes under different process gases or reaction conditions.

RF system protection

Prevent RF power supply from being damaged by reflected power caused by impedance mismatch;

Improve equipment lifespan and operational safety.

3、 Typical application scenarios
Application Device Type Matcher Function Role
Etcher equipment matches RF power and process chamber to stabilize plasma performance
PECVD/ALD deposition equipment ensures stable RF power output during thin film deposition process
Precision control of power for surface modification/cleaning equipment to avoid wafer damage

Product details picture:

ES1D80-003817-15

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